Experiment: 2LYK

NOE-based 3D structure of the CylR2 homodimer at 270K (-3 Celsius degrees)

SOLUTION NMR

NMR Experiment
Experiment	Type	Sample Contents	Solvent	Ionic Strength	pH	Pressure	Temperature (K)	Spectrometer
1	2D 1H-15N HSQC	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
2	2D 1H-13C HSQC aliphatic	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
3	2D 1H-13C HSQC aromatic	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
4	3D 1H-15N NOESY	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
5	3D 1H-13C NOESY aliphatic	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
6	3D 1H-13C NOESY aromatic	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270
7	3D HCCH-TOCSY	0.52 mM [U-100% 13C; U-100% 15N] CylR2_homodimer, 600 mM sodium chloride, 50 mM HEPES, 93 % H2O, 7 % D2O	93% H2O/7% D2O	0.6	7.0	ambient	270

NMR Spectrometer Information
Spectrometer	Manufacturer	Model	Field Strength
1	Bruker	AVANCE III	700

NMR Refinement
Method	Details	Software
simulated annealing		X-PLOR NIH

NMR Ensemble Information
Conformer Selection Criteria	structures with the lowest energy
Conformers Calculated Total Number	200
Conformers Submitted Total Number	20
Representative Model	1 (closest to the average)

Computation: NMR Software
#	Classification	Version	Software Name	Author
1	refinement	X-PLOR NIH	2.26	Schwieters, Kuszewski, Tjandra and Clore
2	structure solution	CYANA	3.0	Guntert, Mumenthaler and Wuthrich
3	chemical shift assignment	Sparky		Goddard
4	peak picking	Sparky		Goddard
5	processing	NMRPipe		Delaglio, Grzesiek, Vuister, Zhu, Pfeifer and Bax