5FLZ
Cryo-EM structure of gamma-TuSC oligomers in a closed conformation
ELECTRON MICROSCOPY
Sample |
---|
RECOMBINANT YEAST GAMMA- TUSC MUTANT S58C G288C |
Specimen Preparation | |
---|---|
Sample Aggregation State | FILAMENT |
Vitrification Instrument | FEI VITROBOT MARK I |
Cryogen Name | ETHANE |
Sample Vitrification Details | CRYOGEN- ETHANE, HUMIDITY- 90, INSTRUMENT- FEI VITROBOT MARK I, METHOD- BLOT FOR 2-5 SECONDS BEFORE PLUNGING, |
3D Reconstruction | |
---|---|
Reconstruction Method | HELICAL |
Number of Particles | |
Reported Resolution (Å) | 6.9 |
Resolution Method | |
Other Details | INITIAL MODELS WERE GENERATED WITH MODELER 9.15 BASED ON PDB ENTRIES 3RIP (FOR GCP2 AND GCP3) AND 3CB2 (FOR GAMMA TUBULIN). TWO COMPLETE GAMMA-TUSC ST ... |
Refinement Type | |
Symmetry Type | HELICAL |
Map-Model Fitting and Refinement | |||||
---|---|---|---|---|---|
Id | 1 | ||||
Refinement Space | REAL | ||||
Refinement Protocol | FLEXIBLE FIT | ||||
Refinement Target | |||||
Overall B Value | |||||
Fitting Procedure | |||||
Details | METHOD--FLEXIBLE FITTING |
Data Acquisition | |||||||||
---|---|---|---|---|---|---|---|---|---|
Detector Type | TVIPS TEMCAM-F816 (8k x 8k) | ||||||||
Electron Dose (electrons/Å**2) | 20 |
Imaging Experiment | 1 |
---|---|
Date of Experiment | 2011-05-25 |
Temperature (Kelvin) | |
Microscope Model | FEI TECNAI F20 |
Minimum Defocus (nm) | 800 |
Maximum Defocus (nm) | 2000 |
Minimum Tilt Angle (degrees) | |
Maximum Tilt Angle (degrees) | |
Nominal CS | 2.12 |
Imaging Mode | BRIGHT FIELD |
Specimen Holder Model | |
Nominal Magnification | |
Calibrated Magnification | 94000 |
Source | FIELD EMISSION GUN |
Acceleration Voltage (kV) | 200 |
Imaging Details |
EM Software | ||
---|---|---|
Task | Software Package | Version |
CTF CORRECTION | CTFFIND | |
MODEL FITTING | MDFF | |
MODEL FITTING | MODELLER | |
RECONSTRUCTION | EMAN | 1 |
RECONSTRUCTION | SPIDER | |
SYMMETRY DETERMINATION | hsearch_lorentz |
Image Processing | ||||
---|---|---|---|---|
CTF Correction Type | CTF Correction Details | Number of Particles Selected | Particle Selection Details | |
EACH MICROGRAPH |