2JVR

Segmental Isotope Labeling of Npl3p

SOLUTION NMR

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NMR Experiment
Experiment	Type	Sample Contents	Solvent	Ionic Strength	pH	Pressure	Temperature (K)	Spectrometer
1	2D 1H-15N HSQC	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
2	2D 1H-13C HSQC	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
3	3D HNCA	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
4	3D HN(CO)CA	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
5	3D CBCA(CO)NH	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
6	3D HNCACB	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
7	3D 1H-15N NOESY	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
8	3D 1H-13C NOESY	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
9	3D HCCH-TOCSY	1 mM [U-15N] Npl3p RRM2, 1 mM [U-13C; U-15N] Npl3p RRM2	90% H2O/10% D2O	0.2	7	ambient	303
10	2D 1H-1H TOCSY	1 mM [U-13C; U-15N] Npl3p RRM2	100% D2O	0.2	7	ambient	303
11	2D 1H-1H NOESY	1 mM [U-13C; U-15N] Npl3p RRM2	100% D2O	0.2	7	ambient	303

NMR Spectrometer Information
Spectrometer	Manufacturer	Model	Field Strength
1	Bruker	DRX	500
2	Bruker	DRX	600
3	Bruker	AVANCE	900

NMR Refinement
Method	Details	Software
simulated annealing		XwinNMR

NMR Ensemble Information
Conformer Selection Criteria	structures with the lowest energy
Conformers Calculated Total Number	100
Conformers Submitted Total Number	20
Representative Model	1 (lowest energy)

Computation: NMR Software
#	Classification	Version	Software Name	Author
1	collection	XwinNMR		Bruker Biospin
2	processing	XwinNMR		Bruker Biospin
3	chemical shift assignment	Sparky		Goddard
4	automated peak picking	ATNOS/CANDID		T. Herrmann
5	automated noe assignment	ATNOS/CANDID		T. Herrmann
6	structure calculation	ATNOS/CANDID		T. Herrmann
7	refinement	Amber	7.0	Case, Darden, Cheatham, III, Simmerling, Wang, Duke, Luo, and Koll